| 摘要 |
<p>An etching device (S) for etching surfaces of a substrate (W) to be treated includes: a treatment tank (10); a conveyer line (40) for conveying the substrate (W) that has been transported into the treatment tank (10); upper and lower etching showers (12, 18) for spraying etching liquid (L) over surfaces of the substrate (W) being conveyed by the conveyer line (40); and a ceiling shower (24) for spraying the etching liquid (L) over a ceiling surface (10c) of the treatment tank (10).</p> |
