MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device which manufactures a pixel electrode with a concavo-convex shape without increasing the number of manufacturing steps.SOLUTION: In a manufacturing method of a semiconductor device, a projected part can be manufactured in accordance with a manufacturing process for a pixel TFT 1203 since reproducibility of the projected part is high when a photomask is used. The projected part is formed by stacking a semiconductor layer, a gate insulation film, and a conduction film as in the manufacturing process for the pixel TFT 1203. An interlayer insulation film is formed to cover the projected part formed thus, as well as a pixel TFT and a TFT included in a driver circuit formed in the same process. After the interlayer insulation film with a concavo-convex shape is formed, a pixel electrode is formed thereon. A surface of the pixel electrode has the concavo-convex shape according to the influence of the concavo-convex surface of the insulation film.