| 发明名称 |
OVERLAY MARK ASSISTANT FEATURE |
| 摘要 |
A method and apparatus for alignment are disclosed. An exemplary apparatus includes a substrate having an alignment region; an alignment feature in the alignment region of the substrate; and a dummy feature disposed within the alignment feature. A dimension of the dummy feature is less than a resolution of an alignment mark detector. |
| 申请公布号 |
US2013330904(A1) |
申请公布日期 |
2013.12.12 |
| 申请号 |
US201313969005 |
申请日期 |
2013.08.16 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
发明人 |
YAO HSIN-CHIEH;WANG HSIEN-CHENG;KAI HUANG CHIEN;CHEN CHUN-KUANG |
| 分类号 |
H01L21/28 |
主分类号 |
H01L21/28 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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