发明名称 |
Electron Beam Lithography System and Method For Improving Throughput |
摘要 |
An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer. |
申请公布号 |
US2013327962(A1) |
申请公布日期 |
2013.12.12 |
申请号 |
US201313971702 |
申请日期 |
2013.08.20 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
SHIN JAW-JUNG;LIN SHY-JAY;WANG WEN-CHUAN;LIN BURN JENG |
分类号 |
H01J37/302 |
主分类号 |
H01J37/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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