发明名称 |
METHOD FOR THE PRODUCTION OF MICROMECHANICAL PARTS THAT ARE DIFFICULT TO REPRODUCE, AND RESULTING MICROMECHANICAL PARTS |
摘要 |
<p>The invention relates to a method for the production of a part, comprising the following steps: a) deposition of a diffractive layer on a substrate; b) deposition of a first photosensitive resin layer on the diffractive layer; c) illumination of the first photosensitive resin layer through a first photomask, such as to selectively remove portions of the photosensitive resin; d) etching of the diffractive layer in the areas not covered by the photosensitive resin; e) removal of the first photosensitive resin layer; f) deposition of a conductive layer on top of the substrate, on top of the remaining diffractive layer portions; g) deposition of a second photosensitive resin layer; h) illumination of the photosensitive resin layer through a second photomask, such as to selectively remove portions of the second photosensitive resin layer; i) electroforming-based deposition on top of the conductive layer between the remaining portions of the second photosensitive resin; j) release of the part by removal of at least the photosensitive resin.</p> |
申请公布号 |
WO2013182615(A1) |
申请公布日期 |
2013.12.12 |
申请号 |
WO2013EP61621 |
申请日期 |
2013.06.05 |
申请人 |
MIMOTEC SA |
发明人 |
LORENZ, HUBERT;GENOLET, GREGOIRE;GLASSEY, MARC-ANDRE;WINKLER, PASCAL |
分类号 |
C25D1/10;C25D1/00;C25D5/02;C25D7/00;G03F1/00;G03F7/00;G03H1/00;G03H1/02;G03H1/04 |
主分类号 |
C25D1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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