发明名称 METHOD FOR THE PRODUCTION OF MICROMECHANICAL PARTS THAT ARE DIFFICULT TO REPRODUCE, AND RESULTING MICROMECHANICAL PARTS
摘要 <p>The invention relates to a method for the production of a part, comprising the following steps: a) deposition of a diffractive layer on a substrate; b) deposition of a first photosensitive resin layer on the diffractive layer; c) illumination of the first photosensitive resin layer through a first photomask, such as to selectively remove portions of the photosensitive resin; d) etching of the diffractive layer in the areas not covered by the photosensitive resin; e) removal of the first photosensitive resin layer; f) deposition of a conductive layer on top of the substrate, on top of the remaining diffractive layer portions; g) deposition of a second photosensitive resin layer; h) illumination of the photosensitive resin layer through a second photomask, such as to selectively remove portions of the second photosensitive resin layer; i) electroforming-based deposition on top of the conductive layer between the remaining portions of the second photosensitive resin; j) release of the part by removal of at least the photosensitive resin.</p>
申请公布号 WO2013182615(A1) 申请公布日期 2013.12.12
申请号 WO2013EP61621 申请日期 2013.06.05
申请人 MIMOTEC SA 发明人 LORENZ, HUBERT;GENOLET, GREGOIRE;GLASSEY, MARC-ANDRE;WINKLER, PASCAL
分类号 C25D1/10;C25D1/00;C25D5/02;C25D7/00;G03F1/00;G03F7/00;G03H1/00;G03H1/02;G03H1/04 主分类号 C25D1/10
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