| 摘要 |
The invention relates to a fluoropolymer solvent system including 50 wt % to 99.9 wt % of a composition (A) including dimethyl sulfoxide, and 0.1 wt % to 50 wt % of a composition (B) including at least one ketone. The invention also relates to the solutions including said solvent system and said fluoropolymer, as well as to the uses thereof for manufacturing films, membranes, and coatings. |
