SPUTTERING SOURCE AND CYLINDRICAL SPUTTERING DEVICE COMPRISING SAME

摘要

The sputtering source of a sputtering device may comprise: a cylindrical target which is formed so as to be hollow and is provided so as to be able to rotate; a magnet-support part which is disposed inside of the cylindrical target; a magnet member which is disposed on the magnet-support part and applies a magnetic field around the cylindrical target; and a power-source connecting unit which supplies a power source to the cylindrical target and incorporates a contacting part for making contact with the rotating cylindrical target in a rolling fashion and incorporates a charging part for charging the area around the contacting part with an electrically-conductive fluid. Consequently, power can be stably supplied by using the power-source connecting unit even though the cylindrical target is rotating.