发明名称 CYLINDRICAL SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a ceramics cylindrical sputtering target configured to significantly reduce the occurrence of cracking, chipping, extraordinary discharge and nodule.SOLUTION: A cavity is made of a ceramics cylindrical target material and a cylindrical base material. The cavity is filled with a molten bonding material. Cooling starts from one edge in the cylindrical axial direction to the other edge in sequence. The molten bonding material is further put into the cavity during cooling, thereby producing a ceramics cylindrical sputtering target in which the total sum area of portions where any bonding material does not exist is ≤10 cmper 50 cmof X-ray transparent photograph area and the maximum area of the portions where any bonding material does not exist is ≤9 cmin an X-ray transparent photograph of the bonding material.
申请公布号 JP2013249544(A) 申请公布日期 2013.12.12
申请号 JP20130168721 申请日期 2013.08.14
申请人 TOSOH CORP 发明人 TODOKO SHIGEHISA;TAMANO KIMIAKI;ITO KENICHI;SHIBUTAMI TETSUO
分类号 C23C14/34 主分类号 C23C14/34
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