发明名称 Metal titanium production device and metal titanium production method
摘要 <p>A metal titanium production device comprising: (a) a magnesium evaporation unit in which solid magnesium is evaporated and a first flow path which is communicated with the evaporation unit and through which gaseous magnesium is supplied; (b) a second flow path through which gaseous titanium tetrachloride is supplied; (c) a gas mixing unit which is communicated with the first flow path and the second flow path and in which the gaseous magnesium is mixed with titanium tetrachloride, the absolute pressure is adjusted to 50 to 500 kPa and the temperature is adjusted to 1600˚C or higher; (d) a metal titanium precipitation unit which is communicated with the gas mixing unit and in which a precipitation substrate having at least partially a temperature of 715 to 1500˚C is placed and the absolute pressure is adjusted to 50 to 500 kPa; and (e) a mixed gas discharge unit which is communicated with the metal titanium precipitation unit.</p>
申请公布号 AU2011236279(B2) 申请公布日期 2013.12.12
申请号 AU20110236279 申请日期 2011.03.07
申请人 TEKNA PLASMA SYSTEMS INC.;HITACHI METALS, LTD. 发明人 HAN, GANG;SHOJI, TATSUYA;UESAKA, SHUJIROH;FUKUMARU, MARIKO;BOULOS, MAHER I.;GUO, JIAYIN;JUREWICZ, JERZY
分类号 C22B34/12;C22B5/04 主分类号 C22B34/12
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