发明名称 METHOD OF LOADING A FLEXIBLE SUBSTRATE AND LITHOGRAPHY APPARATUS
摘要 A method of loading a flexible substrate (38), a device manufacturing method, an apparatus for loading a flexible substrate, and a lithography apparatus. According to an embodiment, there is provided a method of loading a flexible substrate onto a support (42) for use in an exposure apparatus, including transferring the substrate progressively from a substrate carrier (40) to the support in a way that a boundary line (45) separating a region of the substrate that is loaded onto the support and a region of the substrate that is not yet loaded onto the support remains substantially straight during the loading process.
申请公布号 WO2013107684(A3) 申请公布日期 2013.12.12
申请号 WO2013EP50402 申请日期 2013.01.10
申请人 ASML NETHERLANDS B.V. 发明人 LOOPSTRA, ERIK;DONDERS, SJOERD;ZAAL, KOEN;CADEE, THEODORUS PETRUS MARIA
分类号 G03F7/20 主分类号 G03F7/20
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