| 摘要 |
PROBLEM TO BE SOLVED: To prevent breakage of a substrate by reducing occurence of particles.SOLUTION: An apparatus for drying a substrate includes: a housing providing a space in which a drying process is performed; a substrate support member supporting the substrate in the housing; a supply line supplying a process fluid of a supercritical state to the housing; and a discharge line discharging the process fluid from the housing. The supply line includes a first supply line for supplying the process fluid to the housing at a first supply flow rate and a second supply line for supplying the process fluid to the housing at a second supply flow rate. The supply line further includes a front supply line connected to a storage part of the process fluid and a rear supply line connected to the housing. The first supply line and the second supply line are connected in parallel to each other, and connect between the front supply line and the rear supply line. |
