发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide means for improving a quality of a semiconductor device.SOLUTION: A semiconductor device manufacturing method comprises: by arranging a mask sheet 1 on a lower mold 4 such that the mask sheet covers a vacuum port 11 of the lower mold 4 and an opening 1b of the mask sheet 1 overlaps a substrate mounting surface 4d of the lower mold 4, and by supplying a resin for cleaning in a cavity, the resin for cleaning can be brought in contact with a cavity surface of an upper mold 3 and the substrate mounting surface 4d of the lower mold 4. With this configuration, contamination accumulated on the substrate mounting surface 4d can adhere to the resin for cleaning while preventing the resin for cleaning from getting entrance to the vacuum port 11. As a result, a quality of the semiconductor device is improved by successful cleaning of a molding die 2.
申请公布号 JP2013251443(A) 申请公布日期 2013.12.12
申请号 JP20120126117 申请日期 2012.06.01
申请人 RENESAS ELECTRONICS CORP 发明人 TSUCHIDA KIYOSHI;HARADA HARUHIKO;SUZUKI MASAKATSU
分类号 H01L21/56 主分类号 H01L21/56
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