| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a conductive pattern formation substrate which makes conduction and insulation failures of a nanowire less likely to be caused, and to provide the conductive pattern formation substrate manufactured in the manufacturing method.SOLUTION: A manufacturing method of a conductive pattern formation substrate includes: a film formation process where a transparent conductive layer including a metal nanowire NW and an overcoat layer 6 is formed on an insulation substrate 2; a masking process where a mask 100 having an opening exposing part of the transparent conductive layer is formed on the transparent conductive layer; a first removal process where at least part of the overcoat layer 6, which exposes in the opening in the mask 100, is removed by dry etching; and a second removal process where at least part of a silver nanowire NW, which exposes in the opening of the mask 100, is removed after the first removal process. |
