| 摘要 |
PROBLEM TO BE SOLVED: To shorten the time required for defect treatment by omitting additional defect treatment when there is a defect in a processed substrate itself being subjected to charged beam drawing.SOLUTION: A charged beam drawing device for drawing a desired pattern on a processed substrate coated with a photosensitive thin film by irradiating the processed substrate with a charged particle beam includes a data storage unit 11 for storing the drawing data corresponding to the pattern, a coordinate acquisition unit 12 for acquiring the defect coordinate of the processed substrate, a defect verification unit 13 for verifying whether or not a part becomes a defect after processing by collating the defect coordinate thus acquired with the coordinate of the drawing data, and a data changing unit 14 for changing the drawing data so that a part or all of the part determined to become a defect does not function as a circuit after processing. The processed substrate is subjected to drawing based on the drawing data changed by the data changing unit 14. |
