| 摘要 |
<p>The present invention is related to a method for depositing a coating on a substrate (2) by a flame-assisted chemical vapour deposition technique, wherein the substrate is exposed to a flame produced by a burner (1) , while a flow of precursor elements is added to said flame, and wherein the substrate is subjected to a relative movement with respect to said burner, wherein the substrate comprises on its surface or consists of a heat sensitive material, wherein the coating deposition takes place in a number of deposition steps on a optionally pre-heated substrate, each step consisting of a number of subsequent passes on the same portion of the substrate, each pass consisting of a movement of the substrate relative to the flame at a speed of 30m/min or more, no external cooling being applied during said movement, and wherein the substrate is removed from the flame in between said steps, during a period sufficiently long to let the substrate cool down under ambient air to its initial temperature.</p> |
