| 摘要 |
The present invention relates to a susceptor cleaning apparatus and a substrate processing apparatus, and a substrate processing apparatus comprising a susceptor cleaning apparatus after a processed substrate is moved and such a susceptor cleaning apparatus. The embodiment of the present invention includes a cleaning housing having a cleaning space, a boat stacking and separating one susceptor or susceptors, the upper surface of each susceptor stacked and separated from each other, a gas injection unit injecting a cleaning gas at least one among lower surfaces, and a discharging port discharging the injected cleaning gas to the outside of the cleaning chamber. |
