发明名称 |
INFRARED-REFLECTING SUBSTRATE |
摘要 |
<p>Disclosed herein is an infrared reflective substrate that can be easily produced by application onto the surface of a base material, has a film having a small film thickness, and achieves both high light permeability and excellent infrared reflective performance. The infrared reflective substrate includes: a transparent base material; and an infrared reflective layer formed by applying a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion onto the transparent base material, and has a total light transmittance of 60% or higher. The complex preferably has a conductivity of 0.15 (S/cm) or higher, and the infrared reflective layer preferably has a film thickness of 0.50 µm or less.</p> |
申请公布号 |
EP2671929(A1) |
申请公布日期 |
2013.12.11 |
申请号 |
EP20120742723 |
申请日期 |
2012.01.30 |
申请人 |
NAGASE CHEMTEX CORPORATION |
发明人 |
MIYANISHI, KYOKO;FUJITA, TAKAFUMI;HOSOMI, TETSUYA |
分类号 |
C09D201/02;B32B27/00;C08J7/04;C08L65/00;C09D5/24;C09D5/33;C09D7/12;C09D165/00;C09D181/00;G02B5/28 |
主分类号 |
C09D201/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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