发明名称 INFRARED-REFLECTING SUBSTRATE
摘要 <p>Disclosed herein is an infrared reflective substrate that can be easily produced by application onto the surface of a base material, has a film having a small film thickness, and achieves both high light permeability and excellent infrared reflective performance. The infrared reflective substrate includes: a transparent base material; and an infrared reflective layer formed by applying a coating agent containing a complex of poly(3,4-disubstituted thiophene) and a polyanion onto the transparent base material, and has a total light transmittance of 60% or higher. The complex preferably has a conductivity of 0.15 (S/cm) or higher, and the infrared reflective layer preferably has a film thickness of 0.50 µm or less.</p>
申请公布号 EP2671929(A1) 申请公布日期 2013.12.11
申请号 EP20120742723 申请日期 2012.01.30
申请人 NAGASE CHEMTEX CORPORATION 发明人 MIYANISHI, KYOKO;FUJITA, TAKAFUMI;HOSOMI, TETSUYA
分类号 C09D201/02;B32B27/00;C08J7/04;C08L65/00;C09D5/24;C09D5/33;C09D7/12;C09D165/00;C09D181/00;G02B5/28 主分类号 C09D201/02
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