发明名称 METHOD OF FORMING PATTERN
摘要 PURPOSE: A method for forming patterns is provided to protect a material forming the patterns from external effect using a substrate with nano scale concave-convex and a simple coating method. CONSTITUTION: A photosensitive material(12) is coated on the entire surface of a substrate(11) to form a photosensitive material layer through a spin coating method. A nano scale concave-convex is formed on a region of the photosensitive material layer on which a pattern is to be formed through one method selected from a group including a laser interference method, a photolithography method, and a nano imprint method. The region with the nano scale concave-convex is coated with a solution(21).
申请公布号 KR101340782(B1) 申请公布日期 2013.12.11
申请号 KR20090083374 申请日期 2009.09.04
申请人 发明人
分类号 B82B3/00;H01L21/027 主分类号 B82B3/00
代理机构 代理人
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