发明名称 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS
摘要 <p>A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.</p>
申请公布号 EP2671118(A1) 申请公布日期 2013.12.11
申请号 EP20110815777 申请日期 2011.12.13
申请人 GIGAPHOTON INC. 发明人 MORIYA, MASATO;WAKABAYASHI, OSAMU
分类号 G03F7/20 主分类号 G03F7/20
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