发明名称 |
Gas supply system for semiconductor manufacturing facilities |
摘要 |
A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero. |
申请公布号 |
US8601976(B2) |
申请公布日期 |
2013.12.10 |
申请号 |
US20080680159 |
申请日期 |
2008.07.17 |
申请人 |
NISHINO KOUJI;DOHI RYOUSUKE;NAGASE MASAAKI;HIRATA KAORU;SUGITA KATSUYUKI;IKEDA NOBUKAZU;FUJIKIN INCORPORATED |
发明人 |
NISHINO KOUJI;DOHI RYOUSUKE;NAGASE MASAAKI;HIRATA KAORU;SUGITA KATSUYUKI;IKEDA NOBUKAZU |
分类号 |
C23C16/52;C23C16/06;C23C16/22;C23F1/00;H01L21/306 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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