发明名称 NON-SOLVENT TYPE NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>The present invention relates to a non-solvent type negative photosensitive resin composition and, more specifically, to a non-solvent type negative photosensitive resin composition which includes urethane-based multi-functional (meth)acrylate, acrylic monomers, and photopolymerization initiators. The non-solvent type negative photosensitive resin composition according to the present invention has enhanced insulation properties, heat resistance, surface smoothness, light transmittance, and chemical resistance and enhances field effect mobility. The non-solvent type negative photosensitive resin composition can be used as an interlayer dielectric of an organic thin film transistor (OTFT), a flexible display, an organic light emitting device (OLED), an electrophoretic display (EPD), and the likes by performing patterning.</p>
申请公布号 KR20130135145(A) 申请公布日期 2013.12.10
申请号 KR20130061846 申请日期 2013.05.30
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 LEE, JUNG HUN;CHOI, KYUNG HEE;KIM, BYUNG UK
分类号 G03F7/004;G02F1/13;G03F7/26;H01L21/027 主分类号 G03F7/004
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