| 摘要 |
Provided are a gas supplying apparatus and an equipment for etching a substrate edge having the same. The gas supplying apparatus for supplying a gas to a chamber having a reaction compartment includes: a gas spraying unit for spraying gas to the reaction compartment; a gas storage unit for storing the gas; first and second extension passages provided between the gas spraying unit and the gas storage unit; and a leakage preventing unit provided to a connection region of the first and second extension passages to prevent leakage of the gas. The passage through which a gas is provided to the reaction compartment of the chamber is positioned inside the lateral wall of the chamber to prevent damage thereof, and leakage of the gas resulting therefrom can be prevented. An exhaust unit capable of exhausting a toxic gas to the outside is provided on one side of a passage connection portion connecting the passages in case the toxic gas leaks and, therefore, leakage of the toxic gas can be prevented. |
