| 摘要 |
Disclosed is a cleaning solution manufacturing device capable of controlling a resistivity value of a cleaning solution by mixing a solution and cleaning solution water such as ultrapure water in a mixing part and making a cleaning solution having a required resistivity value after making the solution by dissolving gas for reducing resistivity such as carbon dioxide in the cleaning solution water such as ultrapure water in a dissolution part. The cleaning solution manufacturing device according to one embodiment of the present invention comprises: a dissolution part (200) which is connected to a water supply source (400) and a gas supply source (500), dissolves gas in cleaning solution water, and discharges a solution having a lower resistivity value than a required resistivity value; and a mixing part (300) which is connected to the water supply source (400) and the dissolution part (200), mixes the solution made in the dissolution part (200) and the cleaning solution water, and makes and discharges the cleaning solution having the required resistivity value. The cleaning solution manufacturing device continuously discharges gas, which did not dissolve in the cleaning solution water, flowing to the dissolution part (200) in a predetermined amount of flow, wherein a gas discharge line(L2') discharging gas which did not dissolve in the cleaning solution water is connected to the dissolution part and includes a capillary tube (CP). One side and the other side of a liquid discharge line (L2") are connected to the gas discharge line (L2') wherein a valve (V) is formed at the liquid discharge line (L2") to discharge a liquid existing in the gas discharge line (L2') to the outside. [Reference numerals] (AA) Cleaning solution water;(BB) Raw water;(CC) Gas;(DD) Solution |
