发明名称 |
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials |
摘要 |
A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition. |
申请公布号 |
US8603584(B2) |
申请公布日期 |
2013.12.10 |
申请号 |
US201113170221 |
申请日期 |
2011.06.28 |
申请人 |
ALLEN ROBERT DAVID;DIPIETRO RICHARD ANTHONY;DUBOIS GERAUD JEAN-MICHEL;HART MARK WHITNEY;MILLER ROBERT DENNIS;SOORIYAKUMARAN RATNAM;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT DAVID;DIPIETRO RICHARD ANTHONY;DUBOIS GERAUD JEAN-MICHEL;HART MARK WHITNEY;MILLER ROBERT DENNIS;SOORIYAKUMARAN RATNAM |
分类号 |
B05D5/12;B05D3/06;C09D183/04;H05K3/12 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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