APPARATUS AND METHOD FDR CLEANING SUBSTRATES

摘要

The present invention relates to an apparatus and a method for manufacturing a semiconductor substrate and, more specifically, to an apparatus and a method for cleaning a substrate. The substrate cleaning apparatus according to one embodiment of the present invention comprises: a substrate supporting unit for supporting a substrate; a container which covers the substrate supporting unit and collects an organic solvent spattered from the substrate; and a fluid supply unit which is placed on one side of the container and sprays a liquid organic solvent including bubbles onto the substrates. The fluid supply unit includes: a nozzle head for pouring out the organic solvent to the substrate; an organic solvent supply line for supplying the organic solvent from a storage tank to the nozzle head; and a bubble supply member which is provided for the organic solvent supply line in order to supply bubbles to the organic solvent.