| 发明名称 |
PHOTOACTIVE COMPOUND COMPRISING PHOSPHONATE GROUP AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME |
| 摘要 |
<p>The present invention relates to a photoactive compound containing an oxime ester group and a phosphonate group at the same time, and a photosensitive resin composition containing the same. The photoactive compound is a new photoactive compound which can offer excellent developing properties and development residue properties without decreasing sensitivity and chemical resistance.</p> |
| 申请公布号 |
KR20130135083(A) |
申请公布日期 |
2013.12.10 |
| 申请号 |
KR20130058577 |
申请日期 |
2013.05.23 |
| 申请人 |
LG CHEM. LTD. |
发明人 |
CHO, CHANG HO;KIM, SUNG HYUN;KHARBASH RAISA |
| 分类号 |
G03F7/028;G02B5/20;G03F7/032;H01L51/50 |
主分类号 |
G03F7/028 |
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