| 摘要 |
A vapor deposition device includes a base, a hollow rod, a bracket, four bearing seats, and an ion source. The base defines a through hole and four grooves in one surface thereof. The hollow rod is inserted in the through hole and defines four vents in the circumferential direction thereof. The vents point to the upper space of the grooves correspondingly. The hollow rod includes a closed end and an opposite opened end. The bracket is connected to the closed end. The bearing seats are fixed to the bracket so that the bearing seats face the grooves respectively. The ion source is coupled to the opened end. Ions emitted by the ion source are guided by the hollow rod to the vents and the upper spaces of the grooves respectively. |
