| 摘要 |
The present invention relates to a concentration measuring apparatus which measures the alkaline concentration (C1), carbonate concentration (C2), and photoresist (PR) concentration (C3) of an alkaline developer used in the development of PR on a substrate in order to limit the variation of the line width (LW) of a PR pattern below a fixed value. The apparatus comprises a sensor unit which includes at least three sensors for measuring at least three physical properties among first to n^th physical properties of the alkaline developer; and a concentration measuring unit which measures the alkaline concentration (C1), carbonate concentration (C2), and PR concentration (C3) of the alkaline developer through a previously obtained fixed relationship between the measured at least three types of physical property data and the alkaline concentration (C1) of the alkaline developer, through a previously obtained fixed relationship between the measured at least three types of physical property data and the carbonate concentration (C2) of the alkaline developer, and through a previously obtained fixed relationship between the measured at least three types of physical property data and the PR concentration (C3) of the alkaline developer by receiving the input data on the measured at least three types of physical property data measured by the sensor unit among the first to n^th physical properties. [Reference numerals] (10) Manufacturing tank;(20) Developer;(51) Sensor unit;(55) Concentration measuring unit;(56) Concentration regulating unit |
