发明名称 |
METHOD FOR MANUFACTURING THIN FILM BONDED SUBSTRATE FOR SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a thin film bonded substrate for a semiconductor element capable of eliminating a conventional conductive barrier layer, and preventing a decrease in a reflective layer function due to a high temperature step and occurrence of a crack due to the difference between thermal expansion coefficients.SOLUTION: A method for manufacturing a thin film bonded substrate for a semiconductor element includes the steps of: growing an epitaxial growth layer on a first substrate composed of a bulk crystal (S1); forming an ion implantation layer from a boundary surface of the first substrate forming a boundary with one surface of the epitaxial growth layer to a prescribed depth (S2); bonding a third substrate to the other surface of the epitaxial growth layer (S3); separating the first substrate using the ion implantation layer as the boundary and forming a crystalline thin film separated from the first substrate on the one surface of the epitaxial growth layer (S4); bonding a second substrate to the crystalline thin film (S5); and removing the third substrate (S6). |
申请公布号 |
JP2013247362(A) |
申请公布日期 |
2013.12.09 |
申请号 |
JP20130108130 |
申请日期 |
2013.05.22 |
申请人 |
SAMSUNG CORNING PRECISION MATERIALS CO LTD |
发明人 |
KIM DONGHYUN;KIM DONG-WOON;KIM MI KYUNG;KIM MIN-JOO;KIM A-RA;KIM HYUN-JIN;SHUR JOONG WON;WO KWANG-JE;LEE BOHYUN;JEON JONGPIL;JUNG KYUNGSUB |
分类号 |
H01L21/02;H01L21/20;H01L33/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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