| 摘要 |
A method of manufacturing an LCD(Liquid Crystal Display) is provided to form thin film transistors having different gate insulating layer thicknesses simultaneously so as to respectively apply different voltages to the thin film transistors. A substrate(101) divided into a first region and a second region is prepared. A semiconductor layer and a first gate insulating layer are formed on the first region and the second region of the substrate. The semiconductor layer and the first gate insulating layer are patterned to form a first semiconductor pattern(103a) and a first gate insulating pattern(105a) on the first region and form a second semiconductor pattern(103b) on the second region. A second gate insulating layer(111) is formed on the overall surface of the substrate. First and second gate electrodes(113a,113b) are respectively formed on the second gate insulating layer disposed in the first and second regions. Impurity ions are implanted into the first and second semiconductor patterns to form first source and drain regions(103c,103d) and second source and drain regions(103e,103f). |
