| 摘要 |
PURPOSE: An apparatus for cleaning a wafer container is provided to prevent the inflow of foreign materials by directly inducing a dry gas between a transparent tube and a lamp and supplying the dry gas to a cleaning chamber. CONSTITUTION: A dry gas supplying and heating unit (50) includes a dry gas source (52), a dry gas induction pipe (56), and a discharge hole (58). The dry gas source supplies a dry gas. The dry gas induction pipe directly induces the dry gas to a space (14a) between a transparent tube (16) and a lamp (14). The dry gas induction pipe heats the dry gas by the heat of the lamp. The discharge hole is formed on the transparent tube. [Reference numerals] (52) Dry gas source |
