| 发明名称 |
METHOD OF REMOVING NEGATIVE PHOTORESISTS |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of removing polymerized negative photoresists from substrates.SOLUTION: Polymerized negative photoresists are removed from substrates at relatively low temperature and with short stripping time by using aqueous based alkaline solutions. |
| 申请公布号 |
JP2013246441(A) |
申请公布日期 |
2013.12.09 |
| 申请号 |
JP20130107574 |
申请日期 |
2013.05.22 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
PAUL J CICCOLO;BRIAN D AMOS;STEPHEN MCCAMMON |
| 分类号 |
G03F7/42;H05K3/06 |
主分类号 |
G03F7/42 |
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