发明名称 METAL SUBSTRATE WITH INSULATING LAYER AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To highly efficiently manufacture a metal substrate with an anodic oxide film which is less likely to cause warpage and defect.SOLUTION: A method for manufacturing a metal substrate 1a with an insulating layer comprising anodic oxide films (31, 32) on both surfaces thereof comprises the successive steps of: (A) manufacturing an anodized metal substrate 10a; (B) forming a first anodic oxide film 31 by anodizing a first surface 10r of the anodized metal substrate 10a; and (C) forming a second anodic oxide film 32 by anodizing a second surface 10s which is a reverse surface of the first surface 10r by feeding power from the first surface 10r. In the step (A), an energization unit 20 which can be energized from the first surface 10r is uniformly formed on the first surface 10r side in the substrate used when the first surface 10r is anodized in the step (C).
申请公布号 JP2013247187(A) 申请公布日期 2013.12.09
申请号 JP20120118646 申请日期 2012.05.24
申请人 FUJIFILM CORP 发明人 SATO KEIGO
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
主权项
地址