发明名称 POLISHING COMPOSITION, AND POLISHING METHOD AND DEVICE MANUFACTURING METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a polishing composition allowing the polishing speed of a phase change alloy to be improved.SOLUTION: The polishing composition of the present invention contains an oxidizing agent and a polishing accelerating agent and is used in application of polishing a phase change alloy. The oxidizing agent has an oxidation reduction potential enough to oxidize a simplex of an element included in the phase change alloy. When the polishing composition is used in polishing a phase change alloy containing tellurium, it is preferred that the oxidation reduction potential of the oxidizing agent in the polishing composition satisfies the relational expression: E≥-0.059x+0.88. In polishing a phase change alloy containing antimony, it is preferred to satisfy the relational expression: E≥-0.09x+0.72. In polishing a phase change alloy containing germanium, it is preferred to satisfy the relational expression: E≥-0.061x-0.22. In the above formulas, E represents an oxidation reduction potential (unit V) of the oxidizing agent and x represents a pH of the polishing composition.
申请公布号 JP2013247341(A) 申请公布日期 2013.12.09
申请号 JP20120122194 申请日期 2012.05.29
申请人 FUJIMI INC 发明人 IZAWA YOSHIHIRO;YOSHIZAKI YUKINOBU
分类号 H01L21/304;B24B37/00 主分类号 H01L21/304
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