发明名称 MANUFACTURING APPARATUS FOR SILICON CRYSTAL INGOT AND ETCHING DEGREE MEASURING INSTRUMENT OF GRAPHITE CRUCIBLE THEREOF
摘要 PURPOSE: An apparatus for manufacturing a silicon single crystal ingot and an apparatus for measuring the etching degree of a graphite crucible are provided to accurately determine the replacement time of the graphite crucible by accurately measuring the etching degree of the graphite crucible. CONSTITUTION: A graphite crucible supports a quartz crucible which receives silicon melt. An etching degree measuring device (200) slides in contact with the inner side of the graphite crucible and measures the etching degree of the graphite crucible. The etching degree measuring device includes a jig (210) and a step measuring unit (220). The jig is selectively fixed to the upper side of the graphite crucible. The step measuring unit measures the etching degree of the graphite crucible by measuring the step of the inner side of the graphite crucible. The jig includes a contact jig part (211) in contact with the inner side of the graphite crucible and a fixed jig part (212) formed on the upper side of the contact jig part.
申请公布号 KR101339150(B1) 申请公布日期 2013.12.09
申请号 KR20120001630 申请日期 2012.01.05
申请人 发明人
分类号 C04B35/52;C30B13/14;C30B29/06;H01L21/02 主分类号 C04B35/52
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