| 摘要 |
<p>The device has an insulator material (102) with predetermined thickness and applied on an electrically contactable endowed semiconductor material (100). An electrically contactable metal film (104) is applied on the insulator material, and comprises an aperture (106) with predetermined pore width. The pore width comprises a pre-defined ratio to the thickness of the insulator material. The insulator material lies in a region of the aperture. The thickness of the insulator material is smaller than the pore width. The metal film comprises catalytic properties. Independent claims are also included for the following: (1) a method for detecting gas (2) a computer program product having a set of instructions for executing a method for detecting gas.</p> |
