发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 An illumination optical system which illuminates an irradiated plane with illumination light provided from a light source includes a spatial light modulator which is arranged in an optical path of the illumination optical system and cooperates with part of the illumination optical system to form a desired light intensity distribution at a pupil position of the illumination optical system or a position optically conjugated with the pupil position. A detection unit detects the light intensity distribution of the illumination light at a position in an optical path extending from the light source to the spatial light modulator. The detection unit includes a light receiving surface which receives some of the illumination light. A control unit controls the spatial light modulator based on the light intensity distribution detected by the detection unit.
申请公布号 HK1139745(A1) 申请公布日期 2013.12.06
申请号 HK20100105574 申请日期 2010.06.07
申请人 NIKON CORPORATION (KABUSHIKI KAISHA NIKON) 发明人 TANAKA, HIROHISA
分类号 G03F 主分类号 G03F
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