| 摘要 |
The present invention is to form a polyimide layer used for an controllable insulating layer in a process for forming the polyimide layer on a substrate. A wafer (W) is heated to generate the polyimide layer (1). For example, a first process gas including a first monomer of PMDA and a nonaromatic monomer, for example, a second process gas including a second monomer of HMDA are periodically supplied. When the process gas is changed, an exchange gas is supplied to a reaction pipe (32) and the monomers are not mixed with each other in the reaction pipe (32). [Reference numerals] (AA) 1 cycle;(BB) Time |
