发明名称 |
INTEGRATED MICRO-PLASMA LIMITER |
摘要 |
A plasma power limiter fabricated using wafer-level fabrication techniques with other circuit elements. The plasma limiter includes a signal substrate and a trigger substrate defining a hermetically sealed cavity therebetween in which is encapsulated an ionizable gas. The signal substrate includes a signal line within the cavity and the trigger substrate includes at least one trigger probe extending from the trigger substrate towards the transmission line. If a signal propagating on the transmission line exceeds a power threshold, the gas within the cavity is ionized creating a conduction path between the transmission line and the trigger probe that draws off the high power current. |
申请公布号 |
US2013321969(A1) |
申请公布日期 |
2013.12.05 |
申请号 |
US201313865921 |
申请日期 |
2013.04.18 |
申请人 |
CORPORATION NORTHROP GRUMMAN SYSTEMS;NORTHROP GRUMMAN SYSTEMS CORPORATION |
发明人 |
CHANG-CHIEN PATTY;HENNIG KELLY JILL;ZENG XIANGLIN;YANG JEFFREY M. |
分类号 |
H01T4/16 |
主分类号 |
H01T4/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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