发明名称 |
NOZZLE CLEANING DEVICE, NOZZLE CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
A nozzle cleaning device is capable of uniformly cleaning a nozzle from a front end of the nozzle to an upper part thereof. The nozzle cleaning device includes a storage tank, a liquid discharging portion and an overflow discharging portion. The storage tank has a cylindrical inner peripheral surface and is configured to store therein a cleaning liquid that cleans a nozzle used in a substrate process. The liquid discharging portion is configured to discharge the cleaning liquid into the storage tank toward a position eccentric with respect to a central axis of the cylindrical inner peripheral surface to store the cleaning liquid within the storage tank and configured to form a vortex flow of the cleaning liquid revolving within the storage tank. The overflow discharging portion is configured to discharge the cleaning liquid that overflows the storage tank. |
申请公布号 |
US2013319470(A1) |
申请公布日期 |
2013.12.05 |
申请号 |
US201313904315 |
申请日期 |
2013.05.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAI YOSHIHIRO;ISHIKAWA SHINYA;KAMIKAWA YUJI;NAGAMINE SHUICHI;SHINDO NAOKI |
分类号 |
B08B9/032 |
主分类号 |
B08B9/032 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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