| 发明名称 |
POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS |
| 摘要 |
A photo or heat-sensitive polymer comprising recurring units having polymerizable anion-containing sulfonium salt and phenolic hydroxyl-containing recurring units is useful as a base resin to formulate a resist composition having high sensitivity, high resolution and low LWR. |
| 申请公布号 |
US2013323647(A1) |
申请公布日期 |
2013.12.05 |
| 申请号 |
US201313902472 |
申请日期 |
2013.05.24 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OHASHI MASAKI;HATAKEYAMA JUN |
| 分类号 |
G03F7/38;C08F220/30;C08F220/68;C08F224/00;G03F7/004 |
主分类号 |
G03F7/38 |
| 代理机构 |
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代理人 |
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| 地址 |
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