| 摘要 |
Described herein is a method for a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic imaging apparatus, the lithographic process having a plurality of design variables, the method comprising: calculating a gradient of each of a plurality of evaluation points or patterns of the lithographic process, with respect to at least one of the design variables; and selecting a subset of evaluation points from the plurality of evaluation points or patterns based on the gradient. |
