发明名称 |
GERMANIUM FIN FET HAVING METAL GATE AND STRESSOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a germanium fin FET having a metal gate and a stressor.SOLUTION: A plurality of first germanium fins are provided directly on a semiconductor substrate. An n-type fin FET 150 consists of a first gate dielectric 132 on the upper surface and sidewall of the first germanium fin 124, and a first gate electrode 134 on the first gate dielectric. A plurality of second germanium fins are provided directly on a semiconductor substrate. The second germanium fins 224 are separated physically from each other, and interconnected electrically. A p-type fin FET 250 consists of a second gate dielectric 232 on the upper surface and sidewall of the second germanium fin, and a second gate electrode 234 on the second gate dielectric. The first gate electrode and second gate electrode are formed of the same material having a work function between 4.25-4.4 eV. |
申请公布号 |
JP2013243381(A) |
申请公布日期 |
2013.12.05 |
申请号 |
JP20130144426 |
申请日期 |
2013.07.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD |
发明人 |
YEH CHIH-CHIEH;CHANG CHIH-SHENG;WANN HSINGJEN |
分类号 |
H01L21/8238;H01L21/336;H01L27/092;H01L29/78 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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