发明名称 |
METHOD OF LASER IRRADIATION, LASER IRRADIATION APPARATUS, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE |
摘要 |
If an optical path length of an optical system is reduced and a length of a laser light on an irradiation surface is increased, there occurs curvature of field which is a phenomenon that a convergent position deviates depending on an incident angle or incident position of a laser light with respect to a lens. To avoid this phenomenon, an optical element having a negative power such as a concave lens or a concave cylindrical lens is inserted to regulate the optical path length of the laser light and a convergent position is made coincident with a irradiation surface to form an image on the irradiation surface. |
申请公布号 |
US2013323866(A1) |
申请公布日期 |
2013.12.05 |
申请号 |
US201313962984 |
申请日期 |
2013.08.09 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA KOICHIRO;MORIWAKA TOMOAKI |
分类号 |
G02B27/18;H01L33/08;B23K26/06;B23K26/073;B23K26/08;B23K101/40;G02B27/09;G02F1/37;H01L21/20;H01L21/265;H01L21/268;H01L21/77;H01L21/84;H01L27/32;H01L51/52;H01S3/00;H01S5/40 |
主分类号 |
G02B27/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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