| 摘要 |
<p>Provided are a method for production of metal hydroxide highly suited to volume production, whereby it is possible to obtain a metal hydroxide having a uniform desired particle size, without the need for wastewater treatment of the electrolysis solution; and a method for production of ITO sputtering target. A gas diffusion electrode (20) constituted by stacking of a hydrophobic gas diffusion layer (20a) and a hydrophilic reaction layer (20b) is arranged within an electrolysis tank (1), partitioning the electrolysis tank interior. A deposition tank (11) facing the reaction layer of the partitioned electrolysis tank holds an electrolysis solution (S) inside, and indium (4) is immersed into the electrolysis solution. With the gas diffusion electrode as the cathode and the indium as the anode, voltage is applied across the two electrodes, and oxygen is supplied into an air tank (10) facing the gas diffusion layer of the partitioned electrolysis tank to carry out electrolysis, causing indium hydroxide to precipitate into the electrolysis solution.</p> |
