| 摘要 |
PROBLEM TO BE SOLVED: To maintain uniformity of a temperature of a dielectric.SOLUTION: A plasma processing apparatus 10 includes: a processing container 12 defining a processing space S; a microwave generator 16; and a dielectric window 20 having a facing surface 20a facing the processing space S. The plasma processing apparatus 10 includes an antenna 18 which is provided on a surface 20b at the opposite side of the facing surface 20a of the dielectric window 20 and radiates a microwave for plasma excitation to the processing space S through the dielectric window 20 on the basis of a microwave generated by the microwave generator 16. Further, the antenna 18 includes a slot plate 30 provided on the surface 20b at the opposite side of the facing surface 20a of the dielectric window 20 and in which multiple slots 30a are formed, and a heater 31 is provided in the slot plate 30. The uniformity of a temperature of the dielectric window 20 is maintained by heating conducted by the heater 31 provided in the slot plate 30. |
