| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering apparatus capable of attaining film formation with improved quality and productivity by reducing contamination by a bonding material.SOLUTION: In a sputtering apparatus for performing film formation to a plurality of solar cell substrates 40a, 40b, 40c and the like which are placed on a tray 30 by use of a rotary cylindrical target 20 having a plurality of target pieces 20a-20e, the positions of gaps 50a-50d among the target pieces match with portions 30s of the tray 30 in which the solar cell substrates 40a, 40b, 40c and the like are not placed. |
