| 摘要 |
This rolled film formation device is equipped with: a first vacuum chamber into which a first precursor is introduced; a second vacuum chamber into which a second precursor is introduced; a third vacuum chamber into which a purge gas, used for purging the first precursor and the second precursor, is introduced; and transport roller units, which transport a substrate, capable of being rolled up, to the first vacuum chamber, the second vacuum chamber, and the third vacuum chamber, and which have a pair of roller pairs that grip the substrate in the thickness direction of the substrate and have a first roller and a second roller, with a concavo-convex shape being formed on the outer circumferential surface of the first roller and/or the second roller. The transport roller units are used to move the substrate reciprocally between the first vacuum chamber and the second vacuum chamber, thereby depositing an atomic layer on the surface of the substrate and forming an atomic layer deposition film. |
