POLYSTYRENE-POLYACRYLATE BLOCK COPOLYMER, METHOD OF MANUFACTURE THEREOF, AND ARTICLE COMPRISING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide self-assembled films having domain sizes of less than 20 nm with a periodicity of less than 20 nm by a block copolymer.SOLUTION: A block copolymer comprises a first block derived from a vinyl aromatic monomer; and a second block derived from an acrylate monomer; where a chi parameter that measures interactions between the first block and the second block is greater than or equal to about 0.05, when measured at 240°C. A vinyl aromatic monomer is anionically polymerized to form a first block; and a second block is anionically polymerized onto the first block to form a block copolymer through sequential living polymerization.