| 摘要 |
An apparatus for depositing a material layer on a sample inside a vacuum chamber comprises a sample stage (100) for arranging at least one sample (103a, 103b, 103c, 103d); an evaporation source (101, 201), connected to a current source, for a thread-shaped evaporation material (102, 202); a quartz oscillator (105) for measuring the deposited material layer thickness; and an evaluation device (113) associated with the oscillator (105). An electronic control system (112) associated with the evaporation source (101, 201) is configured to deliver electric current in the form of at least two current pulses having a pulse length less than or equal to 1 s. The evaluation device (113) takes into account transient decay behavior of the oscillator (105) immediately after a current pulse to derive the material layer thickness deposited after each pulse. The invention further relates to a method that can be carried out using said apparatus. |
